Movable body apparatus, exposure apparatus, manufacturing method of flat panel display, and device manufacturing method

ABSTRACT

A substrate stage apparatus includes: a fine movement stage movable along the XY plane; an XY two-dimensional stage apparatus (an X beam and an X carriage) which guides the fine movement stage in a direction parallel to the XY plane; a plurality of weight-canceling devices movable in the direction parallel to the XY plane synchronously with the fine movement stage and also working together to support the weight of the fine movement stage; a first Y step guide provided at the +Y side of the X beam in a direction parallel to the Y-axis, that guides a part of the plurality of weight-canceling devices moving in a direction parallel to the X-axis; and a second Y step guide provided at the other side of the X beam in the direction parallel to the Y-axis, that guides the other part of the plurality of weight-canceling devices moving parallel to the X-axis.

CROSS-REFERENCE TO RELATED APPLICATION(S)

This application is a continuation of U.S. application Ser. No.15/129,017 filed Sep. 26, 2016, which is a national stage ofInternational Patent Application No. PCT/JP2015/059090 filed Mar. 25,2015, which is based on and claims priority under 35 U.S.C. 119 fromJapanese Patent Application No. 2014-063315 filed on Mar. 26, 2014. Theentire contents of the above applications are incorporated herein byreference.

TECHNICAL FIELD

The present invention relates to movable body apparatuses, exposureapparatuses, manufacturing methods of flat panel displays, and devicemanufacturing methods, and more particularly to a movable body apparatusincluding a movable body movable along a predetermined two-dimensionalplane, an exposure apparatus including the movable body apparatus, amanufacturing method of a flat panel display using the exposureapparatus, and a device manufacturing method using the exposureapparatus.

BACKGROUND ART

Conventionally, in a lithography process for manufacturing electronicdevices (microdevices) such as liquid crystal display devices andsemiconductor devices (such as integrated circuits), exposureapparatuses are used such as an exposure apparatus of a step-and-scanmethod (a so-called scanning stepper (also called a scanner)), whichwhile synchronously moving a mask or a reticle (hereinafter referred tocollectively as a “mask”) and a glass plate or a wafer (hereinafterreferred to collectively as a “substrate”) along a predeterminedscanning direction, transfers a pattern formed on the mask onto thesubstrate using an energy beam.

As this type of exposure apparatus, an apparatus is known that reducesload of an actuator used to perform positioning of a table, bysupporting a table member holding a substrate from below using aweight-canceling device (also referred to as a central pillar) which isa columnar member (for example, refer to PTL 1).

Now, accompanying the increasing size of substrates in recent years, thesize of the table member holding the substrate also tend to increase,and to cope with this, the size of the weight-canceling device and aguide member for guiding the weight-canceling device is also increasing.

CITATION LIST Patent Literature

[PTL 1] U.S. Patent Application Publication No. 2010/0018950

SUMMARY OF INVENTION Solution to Problem

The present invention was made under the circumstances described above,and from a first aspect, there is provided a movable body apparatus,comprising: a movable body movable along a predetermined two-dimensionalplane including a first axis and a second axis which are orthogonal toeach other; a guide device which guides the movable body in a directionparallel to the first axis and a direction parallel to the second axis;a plurality of weight supporting devices, which are movable in adirection parallel to the two-dimensional plane synchronously with themovable body, that work together to support weight of the movable body;a first guide member, which is provided at one side of the guide devicein a direction parallel to the second axis, that guides some of theplurality of weight supporting devices moving in a direction parallel tothe first axis; and a second guide member, which is provided at theother side of the guide device in a direction parallel to the secondaxis, that guides another of the plurality of weight supporting devicesmoving in a direction parallel to the first axis.

According to this apparatus, the plurality of weight supporting deviceswork together to support the weight of the movable body. That is, theindividual weight supporting devices support a part of the weight of themovable body. Therefore, the load acting on the guide member for guidingthe weight supporting devices can be dispersed compared with the casesupposing that one weight supporting device supports the total weight ofthe movable body, which allows a thinner and lighter guide member. Also,since the movable body is supported at a plurality of places, thisallows the movable body to be thinner and lighter, which makes positioncontrol and posture control easier.

The present invention, from a second aspect, is an exposure apparatus,comprising: a movable body apparatus according to the present inventionin which a predetermined object is held by the movable body; and apattern formation apparatus which forms a predetermined pattern on theobject using an energy beam.

The present invention, from a third aspect, is a manufacturing method ofa flat panel display comprising: exposing the object using the exposureapparatus according to the present invention; and developing the objectwhich has been exposed.

The present invention, from a fourth aspect, is (20) a devicemanufacturing method, comprising: exposing the object using the exposureapparatus according to the present invention; and developing the objectwhich has been exposed.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 A view schematically showing a structure of a liquid crystalexposure apparatus according to an embodiment.

FIG. 2 A planar view (a part of the elements omitted) of a substratestage apparatus that the liquid crystal exposure apparatus in FIG. 1has.

FIG. 3 A sectional view of line A-A in FIG. 2.

FIG. 4 A view showing a first modified example of the substrate stageapparatus.

FIG. 5 A view showing a second modified example of the substrate stageapparatus.

FIG. 6 A view showing a third modified example of the substrate stageapparatus.

FIG. 7 A planar view (a part of the elements omitted) of the substratestage apparatus in FIG. 6.

FIG. 8 A view showing a fourth modified example of the substrate stageapparatus.

FIG. 9 A view showing a fifth modified example of the substrate stageapparatus.

FIG. 10 A view showing a sixth modified example of the substrate stageapparatus.

DESCRIPTION OF EMBODIMENTS

An embodiment will be described below, using FIGS. 1 to 3.

FIG. 1 schematically shows a structure of a liquid crystal exposureapparatus 10 according to the embodiment. Liquid crystal exposureapparatus 10 is a projection exposure apparatus of a step-and-scanmethod, or a so-called scanner, whose exposure subject is arectangular-shaped (square-shaped) glass substrate P (hereinafter,simply called a substrate P) used in devices such as, for example, aliquid crystal display device (a flat panel display).

Liquid crystal exposure apparatus 10 has parts including an illuminationsystem 12, a mask stage 14 that holds a mask M on which a circuitpattern and the like is formed, a projection optical system 16, a pairof stage mounts 18, a substrate stage apparatus 20 that holds substrateP having a resist (sensitive agent) coated on its surface (the surfacefacing a +Z side in FIG. 1), and a control system for these parts.Hereinafter, a direction in which mask M and substrate P are eachrelatively scanned with respect to projection optical system 16 at thetime of exposure will be described as an X-axis direction, a directionorthogonal to the X-axis within a horizontal plane will be described asa Y-axis direction, a direction orthogonal to the X-axis and the Y-axiswill be described as a Z-axis direction, and rotation directions aroundthe X-axis, the Y-axis, and the Z-axis will be described as θx, θy, andθz directions, respectively. Also, positions in the X-axis, the Y-axis,and the Z-axis directions will be described as X position, Y position,and Z position, respectively.

Illumination system 12 is structured similarly to the illuminationsystem disclosed in, for example, U.S. Pat. No. 5,729,331. Illuminationsystem 12 irradiates light emitted from a light source not shown (e.g.,a mercury lamp) on mask M as illumination light for exposure(illumination light) IL, via parts such as a reflection mirror, adichroic mirror, a shutter, a wavelength selection filter, and variouskinds of lenses none of which are shown. As illumination light IL, forexample, lights such as i-line (wavelength 365 nm), g-line (wavelength436 nm), and h-line (wavelength 405 nm) (or synthetic lights of theabove i-line, g-line, and h-line) are used.

Mask stage 14 holds a transmissive mask M. On the lower surface of maskM (the surface facing the −Z side) a predetermined circuit pattern (maskpattern) is formed. Mask stage 14 drives mask M with predetermined longstrokes in the X-axis direction (scanning direction) with respect toillumination system 12 (illumination light IL) via, for example, alinear motor (not shown), along with finely driving mask M in the Y-axisdirection and the ez direction. Position information of mask M in thehorizontal plane is acquired, for example, by a mask stage positionmeasurement system (not shown) including a laser interferometer.

Projection optical system 16 is placed below mask stage 14. Projectionoptical system 16 is a so-called multi-lens projection optical systemwhose structure is similar to the projection optical system disclosedin, for example, U.S. Pat. No. 6,552,775, and is equipped, for example,with a plurality of optical systems that form upright images with adouble telecentric non-magnification system.

In liquid crystal exposure apparatus 10, when an illumination area onmask M is illuminated by illumination light IL from illumination system12, the illumination light that has passed mask M forms a projectionimage (a part of an erected image) of the circuit pattern of mask Mwithin the illumination area via projection optical system 16, onsubstrate P in an irradiation area (exposure area) of the illuminationlight conjugate to the illumination area. Then, scanning exposure isperformed of a shot area on substrate P, by mask M relatively moving inthe scanning direction with respect to the illumination area(illumination light IL) as well as substrate P relatively moving in thescanning direction with respect to the exposure area (illumination lightIL), and the pattern formed on mask M is transferred on the shot area.

The pair of stage mounts 18 each consists of a plate-like memberextending in the Y-axis direction, and is placed apart in the X-axisdirection. Stage mounts 18 are installed on a floor 11 of a clean room,via a plurality of anti-vibration devices 17. On the upper surface ofstage mounts 18, as shown in FIG. 2, for example, three Y linear guides19 a extending in the Y-axis direction are fixed, at a predeterminedspacing in the X-axis direction. The pair of stage mounts 18 is a memberthat structures an apparatus main section (body) of liquid crystalexposure apparatus 10, and the above mask stage 14 and projectionoptical system 16 are supported by the apparatus main section.

Substrate stage apparatus 20 has a plurality of (in the presentembodiment, e.g., three) base frames 22, an X beam 30, an X carriage 40,a pair of Y step guides 50, a fine movement stage 60 (a substrate table62 and substrate holder 64 (not shown in FIG. 2, refer to FIG. 1)), anda plurality of (in the present embodiment, e.g., four) weight-cancelingdevices 70. Note that, although FIG. 2 is a plan view of substrate stageapparatus 20 shown in FIG. 1, to facilitate understanding, substrateholder 64 (refer to FIG. 1) is removed, and along with this, substratetable 62 is shown in a broken line.

For example, the three base frames 22 each consists of a memberextending in the Y-axis direction, and are placed parallel to oneanother at a predetermined spacing in the X-axis direction. The, e.g.,three base frames 22 x are installed on floor 11, with a first baseframe 22 installed at the +X side of stage mount 18 on the +X side, asecond base frame 22 installed at the −X side of stage mount 18 on the−X side, and a third base frame 22 installed in between the pair ofstage mounts 18, in a state where each of the frames have apredetermined clearance with respect to stage mount 18. The, e.g., threebase frames 22, substantially have the same structure. On the upper endsurface of base frame 22 (the end at the +Z side), a Y linear guide 21 ais fixed extending in the Y-axis direction, as shown in FIG. 1. Also, oneach of the side surfaces at both sides of base frame 22, a Y linearmotor stator 23 a is fixed, including a plurality of magnet unitsarranged at a predetermined spacing in the Y-axis direction.

X beam 30, which consists of a member with a rectangular YZ sectionextending in the X-axis direction, is mounted on the, e.g., three baseframes 22 described above. The Z position of the lower surface of X beam30 is set more to the +Z side than the position of the upper surface ofstage mount 18, and X beam 30 is vibrationally isolated from stage mount18. X beam 30 is formed hollow, as shown in FIG. 3, and the dimension inthe height (Z-axis) direction is set larger than the dimension in thewidth (Y) direction. Referring back to FIG. 1, members referred to as Ycarriages 32 are fixed to the lower surface of X beam 30, in thevicinity of both ends in the longitudinal direction and at the center inthe longitudinal direction, with each member corresponding to the, e.g.,three base frames 22. Y carriage 32, which consists of a member havingan inverted U-shaped XZ section, has base frame 22 inserted in between apair of opposing surfaces.

A plurality of Y slide members 21 b (arranged overlapping in the depthdirection of FIG. 1) is fixed to the ceiling surface of Y carriage 32.The plurality of Y slide members is formed having inverted U-shaped XZsections, and engage freely slidable with Y linear guides 21 a fixed tocorresponding base frames 22, via rolling bodies which are not shown(such as, e.g., a plurality of balls). Y slide members 21 b and thecorresponding Y linear guides 21 a structure a mechanical Y linear guidedevice 21, which guides X beam 30 (and, for example, the three Ycarriages 32) in a straight line in the Y-axis direction along the e.g.,three base frames 22. Also, to each of the pair of opposing surfaces ofY carriage 32, a Y linear motor mover 23 b is fixed facing Y linearmotor stator 23 a, which is fixed to the corresponding base frame 22. Ylinear motor mover 23 b has a coil unit not shown, and electrical powersupplied to the coil unit is controlled by a main controller not shown.Y linear motor movers 23 b and the corresponding Y linear motor stators23 a structure Y linear motors 23, which drive X beam 30 (and, forexample, the three Y carriages 32) in the Y-axis direction withpredetermined strokes. Because Y linear motors 23 drive X beam 30 in thecenter along with the vicinity of both ends, flexure in the Y-axisdirection at the center is restrained. Note that, although it is notshown, a Y scale having a periodic direction in the Y-axis direction isfixed to at least one of the, e.g., three base frames 22, and to Ycarriage 32 corresponding to the base frame 22, an encoder head isfixed, which structures a Y linear encoder system for acquiring positioninformation in the Y-axis direction of Y carriage 32 along with the Yscale. Position of X beam 30 in the Y-axis direction is controlled bythe main controller not shown, on the basis of the output of the aboveencoder head.

To the upper surface of X beam 30, a pair of X linear guides 34 a isfixed as shown in FIG. 3. The pair of X linear guides 34 a each consistsof a member extending in the X-axis direction, and are placed parallelto each other at a predetermined spacing in the Y-axis direction. Also,to each side surface of X beam 30 on both sides, an X linear motorstator 35 a is fixed, which includes a plurality of magnet unitsarranged at a predetermined spacing in the X-axis direction.

X carriage 40 consists of a member having an inverted U-shaped YZsection, and X beam 30 is inserted in between a pair of opposingsurfaces. A plurality of X slide members 34 b (arranged overlapping inthe depth direction of FIG. 3) is fixed to the ceiling surface of Xcarriage 40. The plurality of X slide members is formed having invertedU-shaped YZ sections, and engage freely slidable with the pair of Xlinear guides 34 a fixed to X beam 30, via rolling bodies which are notshown (such as, e.g., a plurality of balls). X slide members 34 b andthe corresponding X linear guides 34 a structure a mechanical X linearguide device 34, which guides X carriage 40 in a straight line in theX-axis direction along X beam 30. Also, to each of the pair of opposingsurfaces of X carriage 40, an X linear motor mover 35 b is fixed facingX linear motor stator 35 a, which is fixed to X beam 30. X linear motormover 35 b has a coil unit not shown, and electrical power supplied tothe coil unit is controlled by the main controller not shown. X linearmotor mover 35 b and the corresponding X linear motor stator 35 astructure an X linear motor 35, which drives X carriage 40 in the X-axisdirection with predetermined strokes.

Relative movement of X carriage 40 in the Y-axis direction with respectto X beam 30 is restricted, due to the operation of the above X linearguide device 35. Accordingly, with substrate stage apparatus 20, X beam30 and X carriage 40 move integrally in the Y-axis direction when X beam30 moves in the Y-axis direction with predetermined strokes. That is, Xbeam 30 and X carriage 40 structure a so-called gantry typetwo-dimensional stage apparatus. Note that, although it is not shown, anX scale having a periodic direction in the X-axis direction is fixed toX beam 30, and to X carriage 40, an encoder head is fixed, whichstructures an X linear encoder system for acquiring position informationin the X-axis direction of X carriage 40 along with the X scale.Position of X carriage 40 in the X-axis direction is controlled by themain controller not shown, on the basis of the output of the aboveencoder head.

The pair of Y step guides 50 is placed on the pair of stage mounts 18,as shown in FIG. 2. Of the pair of Y step guides 50, a first Y stepguide 50 is placed at the +Y side of X carriage 40 and a second Y stepguide 50 is placed at the −Y side of X carriage 40, parallel to eachother via a predetermined clearance to X carriage 40. Y step guide 50consists of a member extending in the X-axis direction that has arectangular YZ section. The dimension in the longitudinal direction of Ystep guide 50 is set longer than the movement strokes of fine movementstage 60 in the X-axis direction. Also, although the dimension in thewidth direction of Y step guide 50 is set substantially the same as thedimension in the width direction of X beam 30, the dimension in theheight direction (thickness) of Y step guide 50 is set smaller (thinner)than that of X beam 30, or more specifically, formed in the thickness ofaround half of X beam 30, as shown in FIG. 3. The upper surface of Ystep guide 50 is finished so that it has a high degree of flatness. Aplurality of Y slide members 19 b (arranged overlapping in the depthdirection of FIG. 1) are fixed to the lower surface of Y step guide 50.The plurality of Y slide members 19 b are formed having invertedU-shaped XZ sections, and engage freely slidable with Y linear guides 19a fixed to stage mount 18, via rolling bodies (such as, e.g., aplurality of balls). Y slide members 19 b and the corresponding Y linearguides 19 a structure a mechanical Y linear guide device 19, whichguides Y step guide 50 in a straight line in the Y-axis direction on thepair of stage mounts 18.

Referring back to FIG. 2, each of the pair of Y step guides 50 isconnected to X beam 30 via a plurality of (e.g., two, in the embodiment)coupling devices 52. Coupling devices 52 include a rod-shaped memberextending in the Y-axis direction and hinged joint devices (e.g., a balljoint) provided at both ends in the longitudinal direction of therod-shaped member, and the above rod-shaped member is installed inbetween Y step guide 50 and X beam 30, via the above hinged jointdevices. Therefore, Y step guide 50 and X beam 30 are vibrationallyisolated in the Z-axis direction, the ex direction, and the θy direction(hereinafter referred to as a Z tilt direction). In substrate stageapparatus 20, when X beam 30 is driven to one side of the Y-axisdirection (e.g., the +Y direction), Y step guide 50 at the other side(e.g., the −Y side) moves to the one side (e.g., the +Y direction)integrally with X beam 30 by being pulled by X beam 30 via, for example,the two coupling devices 52, along with Y step guide 50 at the one side(e.g., the +Y side) moving to the one side (e.g., the +Y direction)integrally with X beam 30 by being pushed by X beam 30 via, for example,the two coupling devices 52 due to rigidity of the above rod-shapedmember in the Y-axis direction.

The height position (Z position) of the plurality of coupling devices 52roughly coincides with the center of gravity height position of Y stepguide 50. Therefore, when Y step guide 50 moves in the Y-axis directionby being pulled or pushed by X beam 30, moment (pitching moment) aroundthe X-axis does not act on Y step guide 50, so that stage mount (devicemain section) becomes free from the risk of vibration. Note that, thepair of Y step guides 50 may be coupled to each other with a memberhaving high rigidity, and in this case, Y step guide 50 can be moved inthe Y-axis direction integrally with X beam 30 only by the pulling ofone of the coupling devices 52 (+Y side or the −Y side). Accordingly, ascoupling devices 52, instead of the above rod-shaped member, a ropehaving low rigidity in the Y-axis direction or a thin plate-like membercan also be used. Note that, in the embodiment, although Y step guide 50and X beam 30 are coupled by coupling device 52 in the vicinity of theends in the longitudinal direction of Y step guide 50, the number andposition of coupling devices 52 are not limited in particular. Also,although not shown, a cable guide device is placed between X beam 30 andeach of the pair of Y step guides 50 for guiding cables, which supplyelectricity to X carriage 40, in accordance with the movement of Xcarriage 40.

Fine movement stage 60, as shown in FIG. 3, has substrate table 62 andsubstrate holder 64. Substrate table 62 consists of a boxlike memberhaving a rectangular-shape in a planar view. In the present embodiment,although substrate table 62 is hollow, it may also be made solid.Substrate holder 64 consists of a plate-like member having arectangular-shape in a planar view, and is fixed to the upper surface ofsubstrate table 62, for example, via bolts (not shown). Substrate holder64 has substrate P mounted on its upper surface. Substrate holder 64holds substrate P by suction, using the vacuum chucking force suppliedfrom a vacuum device (not shown) installed external to substrate stagedevice 20.

Fine movement stage 60 is finely driven in directions of three degreesof freedom (the X-axis, the Y-axis, and the θz directions) within ahorizontal plane on X carriage 40, by a fine movement stage drivingsystem which includes a plurality of voice coil motors. In the presentembodiment, the plurality of voice coil motors include, e.g., two Xvoice coil motors 66 x, and e.g., two Y voice coil motors 66 y, as shownin FIG. 2.

One of the, e.g., two X voice coil motors 66 x, and one of the, e.g.,two Y voice coil motors 66 y are placed at the +X side of substratetable 62. In the present embodiment, one of the X voice coil motors 66 xis placed more to the −Y side than the Y position of the center (centerof gravity) of substrate table 62, and one of the Y voice coil motors 66y is placed more to the +Y side than the Y position of the center(center of gravity) of substrate table 62, respectively. Also, the otherof the, e.g., two X voice coil motors 66 x, is placed at the −X side ofsubstrate table 62, diagonal to the above one of the X voice coil motors66 x with respect to the center (center of gravity) of substrate table62. Similarly, the other of the, e.g., two Y voice coil motors 66 y, isplaced at the −X side of substrate table 62, diagonal to the above oneof the Y voice coil motors 66 y with respect to the center (center ofgravity) of substrate table 62.

The one of the X voice coil motors 66 x (+X side of substrate table 62),as shown in FIG. 3, includes a stator 68 a which has a T-shaped sectionand is fixed to the upper surface of X carriage 40 via a supportingcolumn 67, and a mover 68 b which has a U-shaped section and is fixed tothe side surface at the +X side of substrate table 62. X voice coilmotor 66 x, which is a linear motor of a moving magnet type in whichstator 68 a has a coil unit not shown and mover 68 b has a magnet unitnot shown, generates thrust in a direction parallel to the X-axis. Sincethe structure of the other of the X voice coil motors 66 x (not shown inFIG. 3, refer to FIG. 2) is the same as the one of the X voice coilmotors 66 x, the description thereabout will be omitted. Also, becausethe, e.g., two Y voice coil motors 66 y (refer to FIG. 2) are movingmagnet type linear motors having substantially the same structure as Xvoice coil motor 66 x except for the point that the Y voice coil motorgenerates thrust parallel to the Y-axis, the description thereabout willbe omitted. Note that, X voice coil motors 66 x and Y voice coil motors66 y may also be a moving coil type linear motor. Also, the structuremay be employed in which substrate table 62 is finely driven indirections of three degrees of freedom within the horizontal plane,using two-degrees-of-freedom voice coil motors that can generate thrustin the X-axis and Y-axis directions.

Also, for example, the height position (Z position) of each of the,e.g., two X voice coil motors 66 x, and the, e.g., two Y voice coilmotors 66 y (refer to FIG. 2) roughly coincides with the center ofgravity height position of fine movement stage 60, and due to the thrustgiven by the, e.g., two X voice coil motors 66 x, and the, e.g., two Yvoice coil motors 66 y, rotation of fine movement stage 60 in the θx andθy directions (generation of pitching moment) is suppressed.

Referring back to FIG. 1, the main controller not shown makes the thrustin the X-axis and/or Y-axis direction(s) act on (accelerate) substratetable 62 via the above plurality of voice coil motors (X voice coilmotors 66 x, Y voice coil motors 66 y), when making X carriage 40 movein the X-axis and/or Y-axis direction(s) with predetermined strokes.This allows fine movement stage 60, including substrate holder 64holding substrate P, to move in the X-axis and/or Y-axis direction(s)with predetermined strokes synchronously (integrally) with X carriage40. Also, the main controller not shown finely drives fine movementstage 60 in the θz direction with respect to X carriage 40, by makingthe output (thrust) of each of the, e.g., two X voice coil motors 66 x(or the, e.g., two Y voice coil motors 66 y) different. Note that,although it is not shown in the drawings, attached to the above Xcarriage 40 are parts, such as, a stopper member which mechanically setsthe movement range of fine movement stage 60 with respect to X carriage40, and a gap sensor for measuring relative movement amount of finemovement stage 60 in the X-axis and Y-axis directions with respect to Xcarriage 40.

Also, the fine movement stage driving system has a plurality of Z voicecoil motors 66 z for finely driving fine movement stage 60 in the Z tiltdirection with respect to X carriage 40. In the present embodiment, forexample, a total of four Z voice coil motors 66 z are placed,corresponding to the four corner sections of substrate table 62, asshown in FIG. 2. Z voice coil motors 66 z, as shown in FIG. 3, aremoving magnet type linear motors that include stators 68 a having coilunits not shown and movers 68 b having magnet units not shown, similarlyto the above X voice coil motors 66 x, and generate thrust parallel tothe Z-axis. Stators 68 a are fixed to the side surface of X carriage 40,while movers 68 b are fixed to the lower surface of substrate table 62via brackets 69, so that, for example, the four Z voice coil motors 66 zare placed within the space between substrate table 62 and Y step guide50.

Position information of fine movement stage 60 in directions of threedegrees of freedom (the X-axis, the Y-axis, and the θz directions)within the horizontal plane is acquired by a laser interferometer notshown fixed to the apparatus main body, using, for example, a mirror notshown provided at substrate table 62. Also, position information in theZ tilt direction of fine movement stage 60 is acquired, for example, bya plurality of laser displacement sensors (not shown) fixed to substratetable 62, with the upper surface of Y step guide 50 (or a target fixedto weight-canceling device 70) serving as a reference. The structure ofthe position measurement system for measurement in directions of sixdegrees of freedom of the above fine movement stage 60 is disclosed in,for example, U.S. Patent Application Publication No. 2010/0018950. Notethat, the structure of the position measurement system of fine movementstage 60 is not limited to this, and for example, an encoder system mayalso be used.

Weight-canceling devices 70 provided in the present embodiment, as shownin FIG. 2, are, e.g., four, and substrate table 62 is supported frombelow by the, e.g., four weight-canceling devices 70. Of the, e.g., fourweight-canceling devices 70, two are mounted on Y step guide 50 at the+Y side set apart from each other in the X-axis direction, and the othertwo are mounted on Y step guide 50 at the −Y side set apart from eachother in the X-axis direction. The, e.g., two weight-canceling devices70 at the +Y side is placed in the space between the, e.g., two Z voicecoil motors 66 z at the +Y side, and the, e.g. two weight-cancelingdevices 70 at the −Y side is placed in the space between the, e.g., twoZ voice coil motors 66 z at the −Y side. The, e.g., fourweight-canceling devices 70 substantially have the same structure;therefore, in the description below, one of the four weight-cancelingdevices will be described.

Weight-canceling device 70, as shown in FIG. 3, has a housing 72 whichconsists of a bottomed cylindrical member having an opening at the +Zside, an air bearing 73 attached to the lower surface of housing 72, anair spring 74 mounted on the bottom surface of housing 72, a Z slidemember 76 mounted on air spring 74, and an air bearing 77 attached to Zslide member 76.

Housing 72, as shown in FIG. 2, is connected to X carriage 40, orconnected to X carriage 40 via brackets 78 having a T-shape in a planarview fixed to X carriage 40, via a plurality of (e.g., three in theembodiment) coupling devices 79. Coupling devices 79 include arod-shaped member (or a thin plate, a rope or the like) extending in adirection parallel to the XY plane and hinged joint devices (e.g., aball joint) provided at both ends in the longitudinal direction of therod-shaped member, and the above rod-shaped member is installed inbetween weight-canceling device 70 and X carriage 40 (or brackets 78),via the above hinged joint devices. The, e.g., three coupling devices 79are placed radially around the Z-axis at an almost equal spacing. In thepresent embodiment, two of the, e.g., three coupling devices 79 areinstalled between housing 72 and X carriage 40, and the remainingcoupling device 79 is installed between housing 72 and bracket 78.Positions in directions of three degrees of freedom (the X-axis, theY-axis, and the θz directions) within the horizontal plane of housing 72are restricted by X carriage 40 due to the operation of the, e.g., threecoupling devices 79, whereas the position in the Z tilt direction isvibrationally isolated.

Air bearing 73 is attached to the bottom surface of housing 72, in astate where the bearing surface (gas blowout surface) faces the −Z side.The bearing surface of air bearing 73 faces the upper surface of Y stepguide 50, and weight-canceling device 70 is mounted on Y step guide 50in a non-contact manner by static pressure of pressurized gas whichblows out from air bearing 73 to the upper surface of Y step guide 50.Note that, although one air bearing 73 is used in the presentembodiment, the number of air bearings used is not limited to this, anda plurality of air bearings may be used.

To air spring 74, pressurized gas is supplied from the outside ofweight-canceling device 70. Air spring 74 makes an upward force in adirection of gravitational force act on Z slide member 76. The pressureof pressurized gas supplied to air spring 74 is appropriately controlledby the main controller. Z slide member 76 consists of a cylindrical (ora plate-like) member extending in the Z-axis direction, and is insertedinto the inner diameter side of housing 72. Z slide member 76 is guidedto housing 72 with low friction, via, e.g., an air bearing not shown,and relative movement with respect to housing 72 is restricted indirections of five degrees of freedom (the X-axis, the Y-axis, the ez,the ex, and the ey directions). Air bearing 77 is attached to the upperend surface of Z slide member 76 freely swingable with respect to thehorizontal plane via, for example, a hinge device or the like, in astate where the bearing surface (gas blowout surface) faces the +Z side.The bearing surface of air bearing 77 faces the lower surface ofsubstrate table 62. Of the lower surface of substrate table 62, the partfacing the bearing surface of air bearing 77 is finished so that it hasa high degree of flatness. Weight-canceling device 70 supports substratetable 62 from below in a non-contact manner, by static pressure of thepressurized gas blowing out from air bearing 77 to the lower surface ofsubstrate table 62.

In substrate stage apparatus 20, one weight-canceling device 70 makes anupward force in a direction of gravitational force, which is one fourthof the weight of fine movement stage 60, act on fine movement stage 60.This allows the, e.g., four weight-canceling devices 70 to work togetherto cancel out the weight of fine movement stage 60, which reduces theload on the, e.g., four Z voice coil motors 66 z.

Also, in substrate stage apparatus 20, Z tilt position control ofsubstrate P is appropriately performed when fine movement stage 60holding substrate P moves in the X-axis and/or Y-axis direction(s) alongwith X carriage 40 in predetermined strokes. On this operation,substrate table 62 is driven in at least one direction of the Z-axis,the θx, and the θy directions by the plurality of Z voice coil motors 66z. In each of the, e.g., four weight-canceling devices 70, Z slidemember 76 moves in the Z-axis direction with fine strokes by elasticityof air spring 74 along with air bearing 77 tilting (swinging) inaccordance with the tilt amount of the lower surface of substrate table62, in accordance with posture change (moving amount in a directionorthogonal to the horizontal plane, change of tilt amount with respectto the horizontal plane) of substrate table 62. On this operation, themovement of each of the, e.g., four weight-canceling devices 70 isindependent. This allows the weight of fine movement stage 60 to besupported constantly by the, e.g., four weight-canceling devices 70,regardless of the posture of fine movement stage 60.

In substrate stage device 20, when X carriage 40 (and fine movementstage 60) and X beam 30 move integrally in the Y-axis direction withpredetermined strokes, each of the, e.g., four weight-canceling devices70 moves integrally with X carriage 40 in the Y-axis direction withpredetermined strokes, by being pulled (or pushed) by X carriage 40 viathe plurality of coupling devices 79 (and brackets 78). On thisoperation, since X beam 30 and the, e.g., two Y step guides 50, moveintegrally in the Y-axis direction, weight-canceling devices 70 do notfall off from the corresponding Y step guides 50. Also, when X carriage40 (and fine movement stage 60) moves in the X-axis direction along Xbeam 30 with predetermined strokes (including the case when there isalso movement in the Y-axis direction), each of the, e.g., fourweight-canceling devices 70, moves integrally with X carriage 40 in theX-axis direction with predetermined strokes on the corresponding Y stepguides 50, by being pulled (or pushed) by X carriage 40 via theplurality of coupling devices 79 (and brackets 78). The Z position ofthe, e.g., three coupling devices 79, described above is set to aboutthe same as the center of gravity height position of weight-cancelingdevice 70, which prevents weight-canceling device 70 from rotatingaround an axial direction orthogonal to the moving directions (θx, θy)when X carriage 40 moves.

In liquid crystal exposure apparatus 10 (refer to FIG. 1) structured asdescribed above, loading of mask M onto mask stage 14 by a mask loadernot shown and loading of substrate P onto substrate stage apparatus 20by a substrate loader not shown are executed, under the control of themain controller not shown. Then, the main controller executes alignmentmeasurement using an alignment detection system not shown, and when thealignment measurement has been completed, executes exposure operation ofthe step-and-scan method. Note that, since the exposure operation issimilar to the exposure of the step-and-scan method conventionallyperformed, details thereabout will be omitted.

On the above exposure operation, the main controller not shown performscontrol (automatic focusing control) of appropriately driving finemovement stage 60 in the Z tilt direction using the above plurality of Zvoice coil motors 66 z so that, for example, the surface of substrate Pis positioned within the depth of focus of projection optical system 16(refer to FIG. 1). On this automatic focusing control, substrate table62 is finely driven in the Z tilt direction by the plurality of Z voicecoil motors 66 z. Then, the main controller separately controls each ofthe plurality of weight-canceling devices 70, or more specifically, forexample, controls the pressure of the pressurized gas supplied to airspring 74, so that a predetermined upward force is constantly generatedregardless of the Z position of substrate table 62. This reduces theload on the plurality of Z voice coil motors 66 z.

With substrate stage apparatus 20 according to the embodiment describedso far, because the, e.g., four weight-canceling devices 70, support theweight of fine movement stage 60 (that is, the individualweight-canceling devices 70 only has to support, for example, one fourthof the weight of fine movement stage 60), the load acting on Y stepguide 50 guiding (supporting) each of the, e.g., four weight-cancelingdevices 70, is dispersed when compared with the case of a substratestage apparatus (hereinafter referred to as a substrate stage apparatus(not shown) of a comparative example) on the supposition that thesubstrate stage apparatus supports the whole weight of fine movementstage 60 using one weight-canceling device. Accordingly, Y step guide 50(and stage mount 18 which supports Y step guide 50) can be made thinnerand lighter than that of the above substrate stage apparatus of acomparative example. Also, because the individual weight-cancelingdevices 70 can be made smaller and lighter than the above comparativeexample, air bearing 73 for levitating weight-canceling devices 70 on Ystep guide 50 and air bearing 77 for supporting substrate table 62 in anon-contact manner can each be made smaller. Also, thinner Y step guides50 and smaller weight-canceling devices 70 can lower the total height ofsubstrate stage apparatus 20.

Also, because the structure is employed, for example, of supportingsubstrate table 62 from below at four places, deformation caused by theweight of substrate table 62 can be suppressed when compared with thesubstrate stage apparatus of the above comparative example. Accordingly,substrate table 62, in itself, can be made thinner and lighter, whichimproves position controllability of fine movement stage 60. Also, alighter substrate table 62 allows the voice coil motors (X voice coilmotors 66 x, Y voice coil motors 66 y, and Z voice coil motors 66 z) forfinely driving substrate table 62 to be more compact and power saving.Also, substrate table 62 has high rigidity with respect to pitchingmoment because substrate table 62 is supported by the, e.g., fourweight-canceling devices 70.

Also, because the structure is employed in which substrate table 62 issupported at four places which are not located on the same straightline, posture of fine movement stage 60 is stable when compared withthat of the substrate stage apparatus of the above comparative example.Accordingly, an auxiliary device for preventing substrate table 62 fromtilting (falling) such as when, for example, maintenance of substratestage apparatus 20 is performed, will not be necessary. Also, thebearing device (e.g., a spherical bearing device, or a pseudosphericalbearing device as is disclosed in, for example, U.S. Patent ApplicationPublication No. 2010/0018950) for creating a swingable state for finemovement stage 60 will not be necessary, which simplifies the structureof substrate stage apparatus 20.

Also, because the XY two-dimensional stage (X beam 30 and X carriage 40)for guiding fine movement stage 60 along the XY plane is placed betweenthe pair of Y step guides 50, the entire structure of substrate stageapparatus 20 is compact. Also, this improves maintainability ofweight-canceling devices 70.

Note that, the structure of substrate stage apparatus 20 according tothe embodiment described so far can be appropriately changed. Forexample, like substrate stage apparatus 20A according to a firstmodified example shown in FIG. 4, air bearing 77 may be attached to thelower surface of substrate table 62 in a freely tiltable manner, whilefacing the upper end surface (end surface at the +Z side) of Z slidemember 76 of weight-canceling device 70A. In substrate stage apparatus20A according to the first modified example, the bearing surface of airbearing 77 is constantly maintained parallel to the upper end surface(the XY plane) of Z slide member 76, regardless of the posture (tiltangle with respect to the horizontal plane) of fine movement stage 60.Accordingly, this keeps substrate table 62 from moving accidentally dueto its own weight along the guide surface formed by the plurality of airbearings 77.

Also, for example, like a substrate stage apparatus 20B according to asecond modified example shown in FIG. 5, fine movement stage 60B mayhave a first substrate table 62B₁, which is supported by, e.g., two(overlapping in a direction in the depth of the page surface in FIG. 5)weight-canceling devices 70 mounted on Y step guide 50 at the +Y side,and a second substrate table 62B₂, which is supported by, e.g., two(overlapping in a direction in the depth of the page surface in FIG. 5)weight-canceling devices 70 mounted on Y step guide 50 at the −Y side.The first substrate table 62B₁ and the second substrate table 62B₂ arestructured by separate members that are placed apart in the Y-axisdirection. Substrate holder 64 is fixed on the first substrate table62B₁ and the second substrate table 62B₂. According to the secondmodified example, fine movement stage 60B can be made lighter than thatof substrate stage apparatus 20 according to the above embodiment. Also,since the first substrate table 62B₁ and the second substrate table 62B₂are separate, even if thermal expansion or thermal contraction occurs insubstrate holder 64, the first substrate table 62B₁ and the secondsubstrate table 62B₂, distortion of substrate holder 64 caused by thedifference in the expansion amount or the contraction amount betweeneach of the members (a phenomenon similar to a so-called bimetalphenomenon) hardly occurs, which favorably maintains the flatness of theupper surface of substrate holder 64.

Note that, while substrate stage apparatus 20B is structured so that thefirst substrate table 62B₁ is supported by the, e.g., twoweight-canceling devices 70 at the +Y side, and the second substratetable 62B₂ is supported by the, e.g., two weight-canceling devices 70 atthe −Y side (that is, a structure in which substrate table 62 (refer toFIG. 3) of the first embodiment is divided into two members (substratetable 62B₁ and substrate table 62B₂) corresponding to the two Y stepguides 50). This, however, is not limiting, and for example, a structuremay be employed in which substrate table 62 (refer to FIG. 3) may bedivided into two members in correspondence with the two weight-cancelingdevices 70 at the +X side and the two weight-canceling devices 70 (referto FIG. 2 for each of the devices) at the −X side. Or, a structure maybe employed in which substrate table 62 (refer to FIG. 3) may be dividedinto four members in correspondence with each of the, e.g., fourweight-canceling devices 70.

Alternately, like a substrate stage apparatus 20C according to a thirdmodified example shown in, for example, FIGS. 6 and 7, spheroids 80 a to80 d, for X carriage 40 to push substrate table 62 when accelerating anddecelerating fine movement stage 60 (only substrate table 62 is shown inFIG. 7), may be placed facing each of the side surfaces of substratetable 62 at the +X, −X, +Y and −Y sides, as shown in FIG. 7. Spheroids80 a to 80 d are each disposed as shown in FIG. 6, rotatable around anaxis parallel to the Z-axis by X carriage 40 or rotary motors 82 placedon brackets 78, for example, at an angle of 90 degrees.

In substrate stage apparatus 20C, for example, when acceleratingsubstrate table 62 which is in a stopped state in the −X direction asshown in FIG. 7, spheroid 80 a placed at the +X side of substrate table62 is rotationally driven to a position where its long axis is parallelwith the X-axis. Then, by moving X carriage 40 in the −X direction in astate where the outer peripheral surface of spheroid 80 a and the sidesurface of substrate table 62 are in contact, thrust can be given from Xcarriage 40 to substrate table 62 (substrate table 62 can beaccelerated) without using X voice coil motor 66 x. In contrast, in thecase of controlling the position of substrate table 62 within thehorizontal plane with high precision, spheroid 80 a is rotationallydriven to a position so that its long axis is parallel to the sidesurface of substrate table 62 that spheroid 80 a faces, like forexample, each of the spheroids 80 b to 80 d at the −X, the +Y, and the−Y sides in FIG. 7. In this state, substrate table 62 can be finelydriven, since a predetermined clearance is formed between spheroids 80 ato 80 d and substrate table 62. According to the third modified example,the energy efficiency is high, since fine movement stage 60 can beaccelerated/decelerated without using X voice coil motors 66 x and Yvoice coil motors 66 y.

Note that, although spheroids 80 a to 80 d were placed external tosubstrate table 62 in the third modified example, this is not limiting,and for example, spheroids 80 e and 80 f may be housed in openings 86 aand 86 b formed in substrate table 62 like substrate stage apparatus 20Daccording to a fourth modified example, as shown in FIG. 8. Spacing inthe X-axis direction between wall surfaces that set opening 86 a andspacing in the Y-axis direction between wall surfaces that set opening86 b are set about the same as (actually slightly longer than) thelength of the long axis of spheroids 80 e and 80 f. In the fourthmodified example, when accelerating/decelerating substrate table 62 inthe X-axis direction, the long axis of spheroid 80 e is to be parallelto the X-axis, and when accelerating/decelerating substrate table 62 inthe Y-axis direction, the long axis of spheroid 80 f is to be parallelto the Y-axis. Also, when finely driving substrate table 62, the longaxis of spheroid 80 e is to be parallel to the Y-axis, and the long axisof spheroid 80 f is to be parallel to the X-axis.

Also, in the above embodiment (and the first to fourth modifiedexamples), although X beam 30 is driven by Y linear motor 23 (refer toFIG. 1) and X carriage 40 is driven by X linear motor 35 (refer to FIG.3), respectively, the type of actuators for driving X beam 30 and Xcarriage 40 are not limited to these, and for example, devices includinga feed screw device, a belt driving device, and a wire driving devicemay also be used. Also, in substrate stage apparatus 20, 20A to 20D,because the X position of substrate table 62 is controlled by highprecision by the fine movement stage driving system including the Xvoice coil motor 66 x (fine movement stage 60 is finely driven),positioning accuracy of the X position of X carriage 40 may be lowerthan that of substrate table 62. Therefore, like substrate stageapparatus 20E according to a fifth modified example shown, for example,in FIG. 9, X carriage 40E may be driven by, e.g., four X actuators 90,including a link mechanism having a V-shape in a planar view laidbetween X carriage 40E and Y carriage 32, and a rotary motor whichdrives the link mechanism. In substrate stage apparatus 20E, the, e.g.,two X actuators 90, placed at the +X side of X carriage 40E and thee.g., two X actuators 90, placed at the −X side of X carriage 40E worktogether to drive X carriage 40E in the X-axis direction withpredetermined strokes.

Note that, while X actuators 90 according to the above fifth modifiedexample employed the structure in which the link mechanism itself hadactuators, this is not limiting, and as in a substrate stage apparatus20F according to a sixth modified example shown, for example, in FIG.10, the link mechanism may be driven by a feed screw device 92 mountedon an X beam 30F.

Also, in the above embodiment (including the first to fifth modifiedexamples, the same shall apply hereinafter), while the structure wasemployed in which a plurality of weight-canceling devices 70 were pulledby X carriage 40, the structure for integrally moving weight-cancelingdevices 70 and X carriage 40 can be appropriately changed. For example,a structure may be employed in which X carriage 40 pushesweight-canceling device 70 (for example, in a non-contact manner, via anair bearing). Also, a structure may be employed in which a plurality ofweight-canceling devices 70 are coupled to one another with apredetermined coupling member, and the coupling member pulls (or pushes)X carriage 40. Also, a structure may be employed in which a plurality ofweight-canceling devices 70 are driven in a non-contact manner by anactuator (including, for example, a voice coil motor having a statorfixed to X carriage 40 and a mover fixed to weight-canceling device 70,respectively) with respect to X carriage 40.

Also, in the above embodiment, while the structure in which the, e.g.,two weight-canceling devices 70 supported fine movement stage 60 on Ystep guide 50 at the +Y side, and the, e.g., two weight-cancelingdevices 70 supported fine movement stage 60 on Y step guide 50 at the −Yside, the number and placement of weight-canceling devices 70 can beappropriately changed. That is, one each of weight-canceling devices 70may be placed on Y step guide 50 at the +Y side and Y step guide 50 atthe −Y side. Also, the number of weight-canceling devices 70 mounted onthe pair of Y step guides 50 may differ. For example, the structure maybe employed in which one weight-canceling device 70 is mounted on one ofthe Y step guides 50, and two weight-canceling devices 70 are mounted onthe other Y step guide 50. Also, the number of weight-canceling devices70 mounted on one Y step guide 50 is not limited in particular if thenumber is one or more. For example, three or more weight-cancelingdevices 70 may be mounted.

Further, in the above embodiment, the structure is employed in which thedriving mechanism in the X-axis direction including X beam 30, X linearguide device 34, X linear motor 35 and X carriage 40 is disposed in theY-axis direction between the pair of Y step guides 50. However, astructure may be employed in which a plurality of the driving mechanismsin the X-axis direction are disposed with the pair of Y step guides 50arranged in between in the Y-axis direction. In this case, instead ofcoupling devices 52, for example, a coupling device which couples thepair of Y step guides 50 to each other in the Y-axis direction should beprovided. Also, a coupling device for coupling weight-canceling device70 on one of the Y step guides 50 and weight-canceling device 70 on theother Y step guide 50 to each other should be provided. Also, the finemovement stage driving system for finely driving fine movement stage 60in directions of three degrees of freedom should be provided at each Xcarriage 40. Also, in this case, a structure can be employed in whichone weight-canceling device 70 is provided with respect to the pair of Ystep guides 50. On employing this structure, the air bearing providedfor supporting the one weight-canceling device (in other words, a set ofa housing and an air spring), instead of air bearing 73, should be, forexample, an air bearing placed astride the pair of Y step guides 50, ora plurality of air bearings corresponding to each of the Y step guides50 with respect to one housing.

Also, in the above embodiment, while the structure is employed in whichthree sets of the driving mechanisms in the Y-axis direction, includingbase frame 22, Y linear guide device 21 provided at base frame 22, Ylinear motor 23 and Y carriage 32, are placed, the structure in whichfour or more sets are placed may also be employed. In this case, stagemount 18 and Y linear guide device 19 should be placed, for example, inthe X-axis direction in between the plurality of driving mechanisms inthe Y-axis direction.

Also, in the above embodiment, a sensor (called a Z sensor) can beappropriately placed that can measure the height position of finemovement stage 60 driven in the Z-axis direction by Z voice coil motors66 z, with respect to a predetermined reference surface. In this case,the Z sensor can be a sensor which, by irradiating a beam on a surfaceof a predetermined reference member provided at, for example, the uppersurface of Y step guide 50 or weight-canceling device 70 and detectingthe reflected beams, measures the height position (distance in theZ-axis direction) with respect to the reflection surface. Also, thenumber and the position to place the Z sensor can be appropriately set,and for example, a plurality of Z sensors may be provided incorrespondence with each of the pair of Y step guides 50, or a pluralityof Z sensors may be provided in correspondence with each of theplurality of weight-canceling devices 70. Furthermore, a mechanism forcalibrating (calibration of) mutual measurement results of the pluralityof Z sensors should be provided. Or, instead of providing the pluralityof Z sensors, one Z sensor which refers to a typical reference surfacemay be provided.

Also, the illumination light may be ultraviolet light such as an ArFexcimer laser light (wavelength 193 nm), KrF excimer laser light(wavelength 248 nm), or vacuum-ultraviolet light such as an F₂ laserlight (wavelength 157 nm). Also, as the illumination light, for example,a harmonic wave may be used, which is a single-wavelength laser beamingthe infrared or visual region oscillated from a DFB semiconductor laseror a fiber laser amplified by an erbium-doped (or erbium-and-ytterbiumdoped) fiber amplifier, and then whose wavelength is converted into theultraviolet light using a nonlinear crystal. Also, solid-state lasers(wavelength: 355 nm, 266 nm) may also be used.

Also, while the case has been described where projection optical system16 is a projection optical system of a multiple lens method equippedwith a plurality of optical systems, the number of projection opticalsystems is not limited to this, and one or more will be fine. Also, theprojection optical system is not limited to the projection opticalsystem of a multiple lens method, and may also be an Offner typeprojection optical system which uses a large mirror. Also, as projectionoptical system 16, a magnifying system or a reduction system may also beused.

Also, the exposure apparatus to which the embodiment is applied is notlimited to the exposure apparatus for liquid crystals which transfersthe liquid crystal display device pattern onto a square-shaped glassplate, and may also be widely applied, for example, to an exposureapparatus for manufacturing organic EL (Electro-Luminescence) panels, anexposure apparatus for manufacturing semiconductors, or to an exposureapparatus for manufacturing thin film magnetic heads, micromachines, andDNA chips. Also, the above embodiment can be applied not only to anexposure apparatus for manufacturing microdevices such assemiconductors, but also to an exposure apparatus that transfers acircuit pattern onto a glass substrate or a silicon wafer to manufacturea reticle or a mask used in an optical exposure apparatus, an EUVexposure apparatus, an X-ray exposure apparatus, and an electron-beamexposure apparatus.

Also, the object subject to exposure is not limited to a glass plate,and may also be other objects, such as, for example, a wafer, a ceramicsubstrate, a film member, or a mask blank. Also, in the case theexposure object is a substrate for a flat panel display, the thicknessof the substrate is not limited in particular, and includes, forexample, a film-like substrate (a sheet-like member having flexibility).It is to be noted that the exposure apparatus of the present embodimentis especially effective in the case when the exposure object is asubstrate whose length of a side or diagonal length is 500 mm or more.

Electronic devices such as liquid crystal display devices (orsemiconductor devices) are manufactured through the steps such as; astep for performing function/performance design of a device, a step formaking a mask (or a reticle) on the basis of this design step, a stepfor making a glass substrate (or a wafer), a lithography step fortransferring a pattern of a mask (reticle) onto the glass substrate bythe exposure apparatus and the exposure method described in each of theabove embodiments, a development step for developing the glass substratewhich has been exposed, an etching step for removing by etching anexposed member of an area other than the area where the resist remains,a resist removing step for removing the resist that is no longernecessary since etching has been completed, a device assembly step, andan inspection step. In this case, in the lithography step, because thedevice pattern is formed on the glass substrate by carrying out theexposure method previously described using the exposure apparatus of theabove embodiment, this allows a highly integrated device to bemanufactured with good productivity.

It is to be noted that all publications, international publications,U.S. patent application Publications, and U.S. patents quoted in theabove embodiment related to the exposure apparatus and the like, intheir entirety, are incorporated herein by reference.

INDUSTRIAL APPLICABILITY

As described so far, the movable body apparatus of the present inventionis suitable for driving a movable body along a predeterminedtwo-dimensional plane. Also, the exposure apparatus of the presentinvention is suitable for forming a predetermined pattern on an object.Also, the manufacturing method of flat panel displays of the presentinvention is suitable for producing flat panel displays. Also, thedevice manufacturing method of the present invention is suitable forproducing microdevices.

REFERENCE SIGNS LIST

-   10 . . . liquid crystal exposure apparatus,-   20 . . . substrate stage apparatus,-   30 . . . X beam,-   40 . . . X carriage,-   50 . . . Y step guide,-   60 . . . fine movement stage,-   70 . . . weight-canceling device,-   P . . . substrate.

1. A movable body apparatus comprising: a movable body movable along apredetermined two-dimensional plane including a first axis and a secondaxis which are orthogonal to each other; a guide device which guides themovable body in a direction parallel to the first axis and a directionparallel to the second axis; a plurality of weight supporting devices,which are movable in a direction parallel to the two-dimensional planesynchronously with the movable body, that work together to supportweight of the movable body; a first guide member, which is provided atone side of the guide device in a direction parallel to the second axis,that guides some of the plurality of weight supporting devices moving ina direction parallel to the first axis; and a second guide member, whichis provided at the other side of the guide device in a directionparallel to the second axis, that guides another of the plurality ofweight supporting devices moving in a direction parallel to the firstaxis.